JPH0250077B2 - - Google Patents

Info

Publication number
JPH0250077B2
JPH0250077B2 JP54022494A JP2249479A JPH0250077B2 JP H0250077 B2 JPH0250077 B2 JP H0250077B2 JP 54022494 A JP54022494 A JP 54022494A JP 2249479 A JP2249479 A JP 2249479A JP H0250077 B2 JPH0250077 B2 JP H0250077B2
Authority
JP
Japan
Prior art keywords
zone
melting
diameter
semiconductor
rod
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP54022494A
Other languages
English (en)
Japanese (ja)
Other versions
JPS54123586A (en
Inventor
Keraa Uorufugangu
Shuretsutaa Geruharuto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens Corp
Original Assignee
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Corp filed Critical Siemens Corp
Publication of JPS54123586A publication Critical patent/JPS54123586A/ja
Publication of JPH0250077B2 publication Critical patent/JPH0250077B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/28Controlling or regulating
    • C30B13/30Stabilisation or shape controlling of the molten zone, e.g. by concentrators, by electromagnetic fields; Controlling the section of the crystal
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/16Heating of the molten zone
    • C30B13/20Heating of the molten zone by induction, e.g. hot wire technique
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10Apparatus
    • Y10T117/1024Apparatus for crystallization from liquid or supercritical state
    • Y10T117/1076Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone
    • Y10T117/1084Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone having details of a stabilizing feature

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
JP2249479A 1978-02-27 1979-02-27 Method of preparing stable melting zone in crucibleefree zone melting for semiconductor crystalline rod Granted JPS54123586A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2808401A DE2808401C3 (de) 1978-02-27 1978-02-27 Verfahren zum Einstellen einer stabilen Schmelzzone beim tiegelfreien Zonenschmelzen eines Halbleiterkristallstabes

Publications (2)

Publication Number Publication Date
JPS54123586A JPS54123586A (en) 1979-09-25
JPH0250077B2 true JPH0250077B2 (en]) 1990-11-01

Family

ID=6033063

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2249479A Granted JPS54123586A (en) 1978-02-27 1979-02-27 Method of preparing stable melting zone in crucibleefree zone melting for semiconductor crystalline rod

Country Status (4)

Country Link
US (1) US4436578A (en])
JP (1) JPS54123586A (en])
DE (1) DE2808401C3 (en])
IT (1) IT1111796B (en])

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0280779U (en]) * 1988-12-09 1990-06-21

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3333960A1 (de) * 1983-09-20 1985-04-04 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Verfahren zur herstellung von versetzungsfreien einkristallstaeben aus silicium
US5409892A (en) * 1988-06-02 1995-04-25 Sumitomo Electric Industries, Ltd. Method of maufacturing superconductor of ceramics superconductive material

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3660062A (en) 1968-02-29 1972-05-02 Siemens Ag Method for crucible-free floating zone melting a crystalline rod, especially of semi-crystalline material
DE2019179A1 (de) 1970-04-21 1971-11-04 Siemens Ag Verfahren und Vorrichtung zum Dotieren von Halbleitermaterial beim tiegelfreien Zonenschmelzen
GB1361710A (en) 1972-11-17 1974-07-30 Belov V F Vertical crucible-free zone melting
JPS4991003A (en]) * 1972-12-26 1974-08-30
DE2640641B2 (de) 1976-09-09 1978-06-29 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum Einstellen einer stabilen Schmelzzone beim tiegelf reien Zonenschmelzen eines Halbleiterkristallstabes

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0280779U (en]) * 1988-12-09 1990-06-21

Also Published As

Publication number Publication date
DE2808401A1 (de) 1979-08-30
JPS54123586A (en) 1979-09-25
IT1111796B (it) 1986-01-13
US4436578A (en) 1984-03-13
IT7920470A0 (it) 1979-02-23
DE2808401C3 (de) 1984-07-19
DE2808401B2 (de) 1983-06-16

Similar Documents

Publication Publication Date Title
TW219955B (en])
US4303465A (en) Method of growing monocrystals of corundum from a melt
JPH06345584A (ja) 単結晶引上げ方法およびその装置
US5067551A (en) Method for manufacturing alloy rod having giant magnetostriction
US6001170A (en) Process and apparatus for the growth of single crystals
US3351433A (en) Method of producing monocrystalline semiconductor rods
US6755910B2 (en) Method for pulling single crystal
US5840116A (en) Method of growing crystals
JP2509477B2 (ja) 結晶成長方法及び結晶成長装置
JPH0250077B2 (en])
JP2619611B2 (ja) 単結晶の製造装置および製造方法
US3261722A (en) Process for preparing semiconductor ingots within a depression
JPH06340490A (ja) シリコン単結晶製造装置
US5089082A (en) Process and apparatus for producing silicon ingots having high oxygen content by crucible-free zone pulling, silicon ingots obtainable thereby and silicon wafers produced therefrom
JP3152971B2 (ja) 高純度銅単結晶鋳塊の製造方法
US20090293802A1 (en) Method of growing silicon single crystals
JP2020050544A (ja) 鉄ガリウム合金単結晶育成用種結晶
JP3849639B2 (ja) シリコン半導体単結晶の製造装置及び製造方法
GB2084046A (en) Method and apparatus for crystal growth
JPH10287488A (ja) 単結晶引き上げ方法
JP2000239096A (ja) シリコン単結晶の製造方法
JPH09278581A (ja) 単結晶製造装置および単結晶製造方法
JP2735740B2 (ja) シリコン単結晶の製造方法
JPH07109195A (ja) 結晶成長装置及び結晶成長方法
JPH08333189A (ja) 結晶引き上げ装置